Synchrotron Radiation to study Atomic Layer Deposition

Session

Talks 3

14 Jun 2016, 09:00

ALBA Synchrotron

37. In-situ characterization during ALD

Prof. Christophe Detavernier

14/06/2016, 09:00

31. The need for validation of ALD mechanisms predicted from first principles

Dr Simon Elliott (Tyndall National Institute)

14/06/2016, 09:45

oral

18. Controlling the Ti Oxidation State in TiO2 – An In-Line XPS Study

Dr Aafke Bronneberg (Helmholtz-Zentrum Berlin)

14/06/2016, 10:05

oral

10. In Situ Study of the Morphological Stability of ALD-Grown Pt Nanoparticles During Thermal Annealing

Dr Eduardo Solano (Ghent Univesity)

14/06/2016, 10:25

oral

24. SR X-ray diffraction and X-ray absorption fluorescence spectroscopy study of Er-doped HfO2 deposited by atomic layer deposition

Dr Claudia Wiemer (CNR IMM)

14/06/2016, 11:05

oral

23. On the Oxidation State of MnOx – An In-Line XPS Study

Mr Paul Plate (Helmholtz-Zentrum Berlin, Institute for Solar Fuels)

14/06/2016, 11:25

oral

13. Quantitative and chemical characterization capabilities for atomic layer depositions using synchrotron-based reference-free X-ray spectrometry

Mr Philipp Hoenicke (Physikalisch-Technische Bundesanstalt)

14/06/2016, 11:45

oral

32. XANES and XMCD of pure and Fe doped ZrO2 thin films grown by ALD

Dr Alessio Lamperti (CNR IMM)

14/06/2016, 12:05

oral

26. Interfacial and surface effects during the growth of Sb2Te3/Sb2Se3 ternary films and multilayer structures studied by QCM in situ analysis.

Mr Christoph Wiegand (Universität Hamburg / IFW Dresden)

14/06/2016, 12:25

oral

20. In Situ High Temperature X-Ray Scattering Studies of some Atomic Layer Deposited Layers of Metals and Metal Oxides

Mr Mikko Heikkilä (Laboratory of Inorganic Chemistry, University of Helsinki)

14/06/2016, 12:45

oral