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14:30
BOREAS: Polarization-dependent Soft X-ray Absorption and Resonant Scattering Beamline
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Pierluigi Gargiani
(ALBA)
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14:30
Monitoring of Atomic Layer Deposition by Infrared Spectroscopy
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Martin Kreuzer
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14:30
The non-crystalline diffraction beamline at ALBA
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Juan Carlos Martinez
(ALBA)
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14:30
CLÆSS: the Core Level Absorption & Emission Spectroscopies Beamline at ALBA
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Laura Simonelli
(ALBA)
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14:30
Near Ambient Pressure Photoemission at ALBA
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Carlos Escudero
(ALBA-CELLS)
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14:30
Visualizing the incipient growth of ZnO ultra thin films on InGaAs for tailoring contact resistivity
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Evgenii SKOPIN
(Laboratoire des Matériaux et du Génie Physique, Grenoble INP - Minatec)
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14:30
A Future Path for Selective Atomic Layer Deposition
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Noga Kornblum
(Technion)
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14:30
ALD of Titanium Dioxide Films Used as Protective Coatings for Photoelectrochemical Cells
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Andreas Hajduk
(TU Darmstadt)
Thorsten Cottre
(TU Darmstadt)
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14:30
In Situ GISAXS Characterization of ALD in Mesoporous Thin Films
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Jolien Dendooven
(Ghent University - CoCooN)
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14:30
Phase Transitions in Compositionally Graded Ferroelectric Superlattices
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Anna Razumnaya
(University of Picardie)
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14:30
Atomic layer deposited HfO2-based magnetic tunnel junctions
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Andy Thomas
(IFW Dresden)
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14:30
Untangling Diffraction Contributions from Epitaxial Thin Films
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Henrik Sønsteby
(University of Oslo)