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Synchrotron Radiation to study Atomic Layer Deposition

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ALBA Synchrotron

ALBA Synchrotron
Jolien Dendooven (Ghent University - CoCooN), Massimo Tallarida (ALBA-CELLS)
Description

Atomic Layer Deposition (ALD) relies on sequential exposures of the sample surface to vapor-phase chemical precursors to deposit thin films in a cyclic manner. Each ALD cycle usually results in a sub-monolayer of the desired material. ALD is known for its ultimate thickness control at the atomic level and excellent conformality on complex 3D substrates. These major advantages have been crucial for the introduction of ALD in the microelectronics industry. To continue the industrialization of ALD for a broad range of applications, a fundamental understanding of the underlying chemical and physical processes is needed. Given the low amounts of material that are usually deposited per ALD cycle, fast and surface sensitive techniques are required to study ALD processes.

The high brilliance of a Synchrotron Radiation (SR) light source enables to study the atomic structure of matter as well as its properties. SR-based spectroscopic, scattering, and diffraction techniques are usually quiet fast and have a high degree of accuracy, precision and sensitivity. Therefore, they are very well suited to study ALD growth. However, until now, the use of SR to study ALD has remained a niche activity of a few groups, mostly because of technical obstacles, the limited availability of beam-time and/or issues concerning the use of certain precursors at synchrotron facilities.

This workshop is organized by the ALBA Synchrotron and the COST action HERALD, and aims to gather scientists who are working in both the fields of ALD and SR-based material characterization. The goal is to share experiences, to discuss how to answer fundamental research questions about ALD with SR-based experiments, to find solutions for technical obstacles and to develop new ideas for SR-based ALD experiments.

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  • Sunday, 12 June
    • Welcome Party Somewhere...in Sant Cugat

      Somewhere...in Sant Cugat
  • Monday, 13 June
    • 09:00
      Arrival and registration
    • Talks 1
      • 1
        Welcome messages
      • 2
        ALD – From Ideal to Real
        Speaker: Prof. Ola Nilsen (University of Oslo)
      • 3
        Epitaxial complex oxide thin films by atomic layer deposition
        Speaker: Dr Mariona Coll (ICMAB-CSIC)
      • 10:35
        Coffee break
      • 4
        Controlling the short-range order of amorphous oxides by nanometer size
        Speaker: Mrs Yael Etinger-Geller (Technion)
      • 5
        Straightforward conversion of MnO2 to LixMn2O4 by gas-solid reactions
        Speaker: Dr Ville Miikkulainen (University of Helsinki)
      • 6
        Use of atomic layer deposition for improving pattern transfer in directed self-assembly of PS-b-PMMA
        Speaker: Mrs Laura Evangelio (IMB-CNM (CSIC))
      • 7
        Synchrotron Radiation and thin film growth phenomena
        Speaker: Salvador Ferrer (ALBA-CELLS)
      • 8
        Characterization Capabilities for Atomic Layer Deposition at the National Synchrotron Light Source II
        Speaker: Dr Klaus Attenkofer (Brookhaven National Laboratory)
    • 13:00
      Lunch
    • Posters
      • 9
        A Future Path for Selective Atomic Layer Deposition
        Speaker: Mrs Noga Kornblum (Technion)
      • 10
        ALD of Titanium Dioxide Films Used as Protective Coatings for Photoelectrochemical Cells
        Speakers: Mr Andreas Hajduk (TU Darmstadt), Mr Thorsten Cottre (TU Darmstadt)
      • 11
        Atomic layer deposited HfO2-based magnetic tunnel junctions
        Speaker: Dr Andy Thomas (IFW Dresden)
      • 12
        BOREAS: Polarization-dependent Soft X-ray Absorption and Resonant Scattering Beamline
        Speaker: Dr Pierluigi Gargiani (ALBA)
      • 13
        CLÆSS: the Core Level Absorption & Emission Spectroscopies Beamline at ALBA
        Speaker: Dr Laura Simonelli (ALBA)
      • 14
        In Situ GISAXS Characterization of ALD in Mesoporous Thin Films
        Speaker: Dr Jolien Dendooven (Ghent University - CoCooN)
      • 15
        Monitoring of Atomic Layer Deposition by Infrared Spectroscopy
        Speaker: Martin Kreuzer
      • 16
        Near Ambient Pressure Photoemission at ALBA
        Speaker: Dr Carlos Escudero (ALBA-CELLS)
      • 17
        Phase Transitions in Compositionally Graded Ferroelectric Superlattices
        Speaker: Mrs Anna Razumnaya (University of Picardie)
      • 18
        The non-crystalline diffraction beamline at ALBA
        Speaker: Juan Carlos Martinez (ALBA)
      • 19
        Untangling Diffraction Contributions from Epitaxial Thin Films
        Speaker: Mr Henrik Sønsteby (University of Oslo)
      • 20
        Visualizing the incipient growth of ZnO ultra thin films on InGaAs for tailoring contact resistivity
        Speaker: Mr Evgenii SKOPIN (Laboratoire des Matériaux et du Génie Physique, Grenoble INP - Minatec)
    • Talks 2
      • 21
        Gas-source MBE growth of 2D materials examined using synchrotron radiation
        Speaker: Dr James Engstrom (School of Chemical and Biomolecular Engineering, Cornell University Ithaca, NY, USA)
      • 22
        Speciation depth-profiling of nano-structured specimen by combined GIXRF-NEXAFS
        Speaker: Dr Beatrix Pollakowski (Physikalisch-Technische Bundesanstalt)
      • 23
        Production and tailoring of etched ion-track nanopores and nanotubes by ALD
        Speaker: Dr Mercedes Carrillo Solano (GSI Helmholtzzentrum für Schwerionenforschung GmbH)
      • 17:00
        Coffee break
      • 24
        Bulk Heterojunction Electrodes Based on CNT fibre/ZnO Hybrids Produced by ALD
        Speaker: Mr Alfonso Monreal (IMDEA Materials)
      • 25
        Investigation of Si-doped HfO2 ALD films by means of EXAFS and XANES
        Speaker: Mr Tony Schenk (NaMLab gGmbH)
      • 26
        SAXS Investigation of Nano-Pore Membranes Coated By Atomic Layer Deposition
        Speaker: Ms Andrea Hadley (Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University)
  • Tuesday, 14 June
    • Talks 3
      • 27
        In-situ characterization during ALD
        Speaker: Prof. Christophe Detavernier
      • 28
        The need for validation of ALD mechanisms predicted from first principles
        Speaker: Dr Simon Elliott (Tyndall National Institute)
      • 29
        Controlling the Ti Oxidation State in TiO2 – An In-Line XPS Study
        Speaker: Dr Aafke Bronneberg (Helmholtz-Zentrum Berlin)
      • 30
        In Situ Study of the Morphological Stability of ALD-Grown Pt Nanoparticles During Thermal Annealing
        Speaker: Dr Eduardo Solano (Ghent Univesity)
      • 10:45
        Coffee break
      • 31
        SR X-ray diffraction and X-ray absorption fluorescence spectroscopy study of Er-doped HfO2 deposited by atomic layer deposition
        Speaker: Dr Claudia Wiemer (CNR IMM)
      • 32
        On the Oxidation State of MnOx – An In-Line XPS Study
        Speaker: Mr Paul Plate (Helmholtz-Zentrum Berlin, Institute for Solar Fuels)
      • 33
        Quantitative and chemical characterization capabilities for atomic layer depositions using synchrotron-based reference-free X-ray spectrometry
        Speaker: Mr Philipp Hoenicke (Physikalisch-Technische Bundesanstalt)
      • 34
        XANES and XMCD of pure and Fe doped ZrO2 thin films grown by ALD
        Speaker: Dr Alessio Lamperti (CNR IMM)
      • 35
        Interfacial and surface effects during the growth of Sb2Te3/Sb2Se3 ternary films and multilayer structures studied by QCM in situ analysis.
        Speaker: Mr Christoph Wiegand (Universität Hamburg / IFW Dresden)
      • 36
        In Situ High Temperature X-Ray Scattering Studies of some Atomic Layer Deposited Layers of Metals and Metal Oxides
        Speaker: Mr Mikko Heikkilä (Laboratory of Inorganic Chemistry, University of Helsinki)
    • 13:05
      Lunch
    • Talks 4
      • 37
        Live monitoring of ALD by ambient pressure x-ray photoelectron spectroscopy
        Speaker: Prof. Joachim Schnadt
      • 38
        The MOON reactor: optimizing oxyde nanostructures ALD by combining in situ synchrotron X-ray and optical analysis
        Speaker: Prof. Hubert Renevier (Grenoble Institut of Technology)
      • 39
        Aluminum Nitride Grown by Atomic Layer Epitaxy Characterized with Real-Time Grazing Incidence Small Angle X-ray Scattering
        Speaker: Dr Virginia Anderson (US Naval Research Laboratory)
      • 40
        Near-Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of HfO2 on SiO2 / Si
        Speaker: Dr Christelle Yeromonahos (CNRS)
      • 16:40
        Coffee break
      • 41
        Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO₄ and H₂ at low temperatures
        Speaker: Mr Matthias Minjauw (Ghent University)
      • 42
        An atomistic view of the incipient growth of zinc oxide by in-situ x-ray absorption spectroscopy
        Speaker: Dr Gianluca Ciatto (Synchrotron SOLEIL)
      • 43
        In Situ Synchrotron-based XRF and GISAXS Study of ALD Encapsulation of Supported Nanocrystals
        Speaker: Dr Jolien Dendooven (Ghent University - CoCooN)
      • 44
        Open Session proposals
    • Social dinner La Plaça...in Sant Cugat

      La Plaça...in Sant Cugat
  • Wednesday, 15 June
    • Visit to ALBA
    • 11:00
      coffee break
    • Open session
    • 13:00
      Lunch break Experimental Hall

      Experimental Hall
    • Tutorials
      • 45
        EXAFS - Tutorial
        Speaker: Dr Andris Anspoks (Institute of Solid State Physics, University of Latvia)
      • 46
        GISAXS - tutorial
        Speakers: Dr Jolien Dendooven (Ghent University - CoCooN), Dr Marina Ganeva (Forschungszentrum Juelich GmbH)
    • 16:30
      Coffee break
    • Tutorials
      • 47
        XPS - Tutorial
        Speaker: Prof. Elzbieta Guziewicz (Institute of Physics Polish Academy of Sciences)
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