Synchrotron Radiation to study Atomic Layer Deposition

Session

Talks 4

14 Jun 2016, 14:30

ALBA Synchrotron

38. Live monitoring of ALD by ambient pressure x-ray photoelectron spectroscopy

Prof. Joachim Schnadt

14/06/2016, 14:30

39. The MOON reactor: optimizing oxyde nanostructures ALD by combining in situ synchrotron X-ray and optical analysis

Prof. Hubert Renevier (Grenoble Institut of Technology)

14/06/2016, 15:15

25. Aluminum Nitride Grown by Atomic Layer Epitaxy Characterized with Real-Time Grazing Incidence Small Angle X-ray Scattering

Dr Virginia Anderson (US Naval Research Laboratory)

14/06/2016, 16:00

oral

22. Near-Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of HfO2 on SiO2 / Si

Dr Christelle Yeromonahos (CNRS)

14/06/2016, 16:20

oral

27. Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO₄ and H₂ at low temperatures

Mr Matthias Minjauw (Ghent University)

14/06/2016, 17:00

oral

4. An atomistic view of the incipient growth of zinc oxide by in-situ x-ray absorption spectroscopy

Dr Gianluca Ciatto (Synchrotron SOLEIL)

14/06/2016, 17:20

oral

16. In Situ Synchrotron-based XRF and GISAXS Study of ALD Encapsulation of Supported Nanocrystals

Dr Jolien Dendooven (Ghent University - CoCooN)

14/06/2016, 17:40

oral

40. Open Session proposals

14/06/2016, 18:00